Force State® RF Power Supply Products
Industry and Research
Force State® RF Power Supply Products are built to drive the following application.
PVD
HDP-CVD
Capacitively coupled plasma (CCP)
Inductively Coupled Plasma ( ICP)
Reactive Ion Etching (RIE)
PECVD (Plasma Enhanced Chemical Vapor Deposition)
Plasma Clean System
Atmospheric Plasma
Biomedical-Biochip
Nano-materials
Aurora Product Series
Aurora Integrated Power Supply (IPS)
Aurora Integrated Plasma Equipment (IPE)
Aurora Oxygen/Selected Gas Plasma System
Aurora Atmospheric Plasma System
Product Features:
1. The Integrated Plasma Power Supply (IPS) is one box combo/detachable design for RF Power Generator and Matching Box. RF Plasma could be applied to wider selection of materials for better efficiency versus DC Plasma.
2. The impedance could be adjusted by the IPS with automatic, semi-automatic, and fine tune modes. The VSWR is less than 1.2.
3. The output power/gain could be adjusted continuously.
4. The optional gas module could provide Main Gas (Helium or Argon) and Reactive Gas (Oxygen, Nitrogen and else).
5. The Oxygen/Selected Gas Plasma system and Atmospheric Plasma system solution package is provided.
Force State® 高頻電源產品用來驅動以下應用
物理氣相沉積
高密度化學氣相沉積
電容耦合電漿
感應耦合電漿系統
電漿蝕刻
電漿輔助化學沉積
電漿清潔系統
常壓大氣電漿
生物醫學-生物晶片
奈米材料
Aurora 產品系列
整合式高頻電源供應器
整合式高頻電漿系統
氧氣/選用氣體電漿系統
常壓電漿系統
產品的特色
1. 整合式電漿電源供應器, 結合 RF Power Generator 與 Matching Box為可拆一體式箱體. RF 高頻電漿較直流電漿能處理更多種物體及有效率.
2. 阻抗匹配 Impedance Matching 可以全自動 Automatic, 半自動 Semi-auto, 精密Fine Tune 即時調整. 反射功率 VSWR < 1.2.
3. 輸出功率可以無段自由調整.
4. 提供選配氣體模組可以選用主要氣體 Main Gas (氦氣或氬氣) and 反應氣體 Reactive Gas (氧氣, 氮氣, 及其他).
5. 提供氧氣/選用氣體電漿系統及常壓電漿系統整體解決方案.
