Aurora Integrated RF Power Supply 整合式高頻電源供應器
Application Range In Plasma Systems
PVD                               物理氣相沉積
HDP-CVD                           高密度化學氣相沉積
Capacitively coupled plasma (CCP) 電容耦合電漿and Inductively Coupled Plasma ( ICP)         感應耦合電漿系統 
Reactive Ion Etching (RIE)        電漿蝕刻
PECVD (Plasma Enhanced Chemical Vapor Deposition) 電漿輔助化學沉積
Plasma Clean System               電漿清潔系統
Atmospheric Plasma System         常壓大氣電漿系統
       Biomedical-Biochip                生物醫學-生物晶片
       Nano-materials                    奈米材料

Aurora IPS 300 Integrated RF Power Supply

$14,000.00

Model Number: Aurora IPS 300
System Specification
Input: AC90V-240V,50-60HZ,6A
RF Output Power: MAX 200W (Optional 300W)
Conforms to FCC and CE.
Frequency:13.56MHZ +/- 50PPM
Power Range Adjustment: continuous 1 W to 200 W
Output Impedance: 50ohm
Real Time Automatching (up to 1,000 W)(1.5 KW Optional)
 DC Pulse Trigger
Air Cooling
Dimension (WXDXH): 482 X 560 X 170mm
Weight: about 55 lbs.

Force State RF Generator is Capable of Driving various ICP, CCP, Sputtering, PECVD Vacuum Chamber, and Atmospheric Plasma.

Direct Shop

State-of-the-Art Technology

RF Power Supply, Oxygen Plasma/Selected Gas Plasma System

Aurora IPS 300 Integrated RF Power Supply

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