AuroraTM Oxygen/Selected Gas Plasma System OP-300
Features:
RF Generator for wider treated materials selection and superior efficiency versus DC Plasma.
Inductively Coupled Plasma
Reactive Gas: O2, N2, H2….  
Real Time Impedance Auto-matching
PID heater: For atmospheric plasma (optional) 
Multiple Memory Settings 

Treated Materials:
BIO-MEMS Materials: Cellulose, Cuprophane, PC, PDMS, PE, PET, PGA, PLA, PHEMA, PMMA, PP, PTFE, PVC, Teflon, UHMPE, 
Other polymeric materials: Plastics, Resins, Polymers, Parylene, 
Metal: Ti-Alloy, Ti-Ni, Co-Cr

Aurora Oxygen /Selected Gas Plasma System OP-300

$38,000.00

Aurora Oxygen/Selected Gas Plasma OP-300

Model V: Integrated One Set Design(space savings) Front Opening Chamber
 Dimension (WxDxH): 465 X 600 X 690 mm
 Weight: about 80 kg (including RF Power Supply)

Model H: Individual Chamber (for clean room and negative pressure environments)
- Model H-FO: Front Door Opening Chamber
- Model H-TO: Top Door Opening Chamber
 Dimension (WxDxH): 535 X 435 X 420 mm
 Weight: about 43 kg

System Specification
1. RF Power Supply
 Input: AC90V-240V,50-60HZ,6A
 RF Output Power: MAX 200W (Standard) ; MAX 100 W (Mini)
 Conforms to FCC and CE.
 Frequency:13.56MHZ +/- 50PPM
 Power Range Adjustment: continuous 1 W to 200 W
 Output Impedance:3ohm to 50ohm
 PID Temperature Control: Source Constant heating
 Real Time Auto-matching (up to 1,000 W)(1.5 KW Optional)
 Air Cooling
 Main Gas Flow Range: 0-30 SLM
 Reactive Gas Flow Range: 0-5 SLM
 Connector: 6 mm or 1/4 inch Speed connector
 Dimension (WxDxH): 482 X 560 X 202 mm
 Weight: about 36 kg.

2. Vacuum Chamber
 Chamber Size: Diameter = 250 mm, Depth =220 mm
 Lower Pressure Limit: 20 mTorr

3.Vacuum Gauge Controller plus Pirani Vacuum Gauge Sensor
- Digital Display (1 X 10 exp－3 to 9.9 X 10 exp2 Torr)
- Bright Green LED Display
- Full Range 90 to 260 V AC Power Input 90-260 V

 Accessories
Bellows, Center rings, and clamps
Rotary Pump: 150 Liter/min or equivalent

Force State RF Generator is Capable of Driving various ICP, CCP, Sputtering, PECVD Vacuum Chamber, and Atmospheric Plasma.

Direct Shop

State-of-the-Art Technology

RF Power Supply, Oxygen Plasma/Selected Gas Plasma System

Aurora Oxygen /Selected Gas Plasma System OP-300

Details